Business Wire

Dow Electronic Materials Introduces OPTIVISION™ 4540 CMP Polishing Pad for Copper Barrier Polishing

TAIPEI, Taiwan--(BUSINESS WIRE)--Dow Electronic Materials today introduced the OPTIVISION TM 4540 CMP Polishing Pad designed to deliver low defectivity and low cost of ownership (CoO) over pad ...
Business Wire

Applied Materials Introduces Major Advancement in CMP Polishing Pad Technology

SANTA CLARA, Calif.--(BUSINESS WIRE)--Applied Materials, Inc. today announced its innovative Applied DuraPad ™ CMP polishing pad technology for 200mm chemical mechanical planarization (CMP) systems.
AZOM

Using White Light Interferometry to Characterize CMP Processes

Electronic and computer processors with a higher speed need smaller features for integrated circuits (IC), which also need smoother and smaller substrate surfaces. Chemical mechanical polishing (CMP) ...
PE Hub

Cabot Microelectronics Corp to acquire VC-backed NexPlanar Corp

AURORA, Ill., Sep 28, 2015 (GLOBE NEWSWIRE via COMTEX) –Cabot Microelectronics Corporation, the world’s leading supplier of chemical mechanical planarization (CMP) polishing slurries and a growing CMP ...
EDN

Thomas West Enters CMP Hard Pad Market

Thomas West Inc. (TWI) introduced a hard chemical mechanical planarization (CMP) pad today that will put the small, privately owned Sunnyvale, Calif.-based company up against Rodel Inc., a company ...