Sunfort™ dry film photoresist is a mainstay of Asahi Kasei’s Electronics business, comprising electronic materials and components. The entity is positioned as a First Priority business to drive growth ...

Essential material for advanced semiconductor processes expected to enter stage of accelerated breakthroughs, major Chinese supplier says China's push for semiconductor self-sufficiency is shifting ...

Wood, traditionally used as raw material for paper, is now being explored as a potential source for semiconductor photoresists. According to a report by Nikkei, Japanese papermaker Oji Holdings is ...

The intricate process of photoresist development encompasses raw material synthesis and formulation refinement, with the synthesis and purification of photoresist raw materials posing significant ...

CORVALLIS, Ore.--(BUSINESS WIRE)--Inpria, a pioneer in high-resolution metal oxide photoresists for extreme ultraviolet lithography (EUV), today announced that it has secured $31 million in Series C ...

Asahi Kasei has developed the Sunfort TA series of dry film photoresist for next-generation semiconductor packages requiring circuit patterns with line/space widths of 2/2 µm or less. The film offers ...

Researchers have created a new type of epoxy photoresist that greatly improves the speed and detail of two-photon laser writing. This new material can write at a speed of 100 mm/s and can create tiny ...

Most discussions of advanced lithography focus on three elements — the exposure system, photomasks, and photoresists — but that’s only part of the challenge. Successfully transferring a pattern from ...

Researchers have developed a photoresist for two-photon microprinting. It has now been used for the first time to produce three-dimensional polymer microstructures with cavities in the nano range. The ...

CORVALLIS, Ore.--(BUSINESS WIRE)--Inpria, a pioneer in high-resolution metal oxide photoresists for extreme ultraviolet lithography (EUV), today announced that it has secured $31 million in Series C ...