ASML Developing Next-Gen EUV Lithography
ASML Developing Next-Gen EUV Lithography
Dec 5, 2018
ieee.org
The full EUV optical light path - Inside the TWINSCAN NXE:3400 EUV lithography machine | ASML on Make a GIF
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Thermal deformation of EUV mask according to mask type and pattern density
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How ASML Built the World’s Most Advanced EUV Light Source?
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Press Kit: High NA EUV at Intel
Press Kit: High NA EUV at Intel
9 months ago
intel.com
Our EUV pellicles are 20 times thinner than the membrane of a soap bubble. In our lithography machines, the pellicle prevents particles from contaminating the mask that contains the pattern to be printed on the chip. The pellicle catches the particles and keeps them 'out of focus', while still letting through extreme ultraviolet (EUV) light. | ASML
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